Company Filing History:
Years Active: 2022-2024
Title: Innovations of Hitomi Nishimura
Introduction
Hitomi Nishimura is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of fluoropolymer technology, particularly through his innovative patents. With a total of two patents to his name, Nishimura's work focuses on enhancing the properties and applications of molded articles made from copolymers.
Latest Patents
Nishimura's latest patents include a fluororesin molded article and a PFA molded body with excellent blister resistance. The first patent describes a PFA molded article made from a copolymer of tetrafluoroethylene (TFE) and perfluoro(alkylvinyl ether) (PAVE). This article boasts a flex life value of not less than 2,000,000 times, a zero shear viscosity ranging from 10,000 to 20,000 Pa·s, and a heating weight loss of not more than 0.05% by weight. These characteristics ensure that the molded article maintains excellent mechanical properties while being produced in good yields. The second patent focuses on a molded body with a hollow portion that exhibits excellent blister resistance when in contact with harsh chemicals and under extreme operating conditions.
Career Highlights
Hitomi Nishimura is currently employed at Chemours-Mitsui Fluoroproducts Co., Ltd. His work at this company has allowed him to further develop his expertise in fluoropolymer applications. Nishimura's innovative approach has led to advancements in the production and performance of fluororesin products.
Collaborations
Some of Nishimura's coworkers include Takahiro Nishimura and Chorong Jeong. Their collaborative efforts contribute to the ongoing research and development in the field of fluoroproducts.
Conclusion
Hitomi Nishimura's contributions to the field of fluoropolymer technology through his patents demonstrate his innovative spirit and commitment to advancing material science. His work continues to impact various industries by improving the performance and reliability of fluororesin products.