Kanagawa, Japan

Hisayuki Toda

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Jcu Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisayuki Toda. Retrieved from https://idiyas.com/inventor/hisayuki-toda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Hisayuki Toda: Innovator in Silicon Oligomers

Introduction

Hisayuki Toda is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon oligomers. His innovative work has led to the creation of a novel silicon oligomer that offers unique functionalities not previously achieved.

Latest Patents

Hisayuki Toda holds 1 patent for his invention titled "Silicon oligomer and production method therefor." The objective of this invention is to provide a silicon oligomer with a novel function that surpasses the capabilities of conventional condensation products derived from water and tetraalkoxysilane. The patent outlines a silicon oligomer represented by a specific formula, along with a detailed production method.

Career Highlights

Toda is currently associated with JCU Corporation, where he continues to engage in innovative research and development. His work at the company has positioned him as a key figure in advancing silicon-based materials.

Collaborations

Throughout his career, Hisayuki Toda has collaborated with notable colleagues, including Daisuke Sadohara and Kenichi Nishikawa. These partnerships have fostered a collaborative environment that enhances the innovation process.

Conclusion

Hisayuki Toda's contributions to the field of silicon oligomers exemplify the impact of innovative thinking in materials science. His patent reflects a significant advancement that could lead to new applications and technologies in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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