Hisayuki Katoh

Title: Hisayuki Katoh: Innovator in Thin-Film Transistor Technology

Introduction

Hisayuki Katoh is a notable inventor based in Sakai, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of thin-film transistors. His innovative work has led to advancements that enhance the performance of display apparatuses.

Latest Patents

Hisayuki Katoh holds a patent for a thin-film transistor and its manufacturing method. The patent describes a body layer formed of a semiconductor layer, which includes a first region, a second region, and a channel region positioned between them. The invention features a channel stopper on the channel region, along with source and drain electrodes that are electrically connected to the first and second regions via contact layers. Each contact layer consists of an impurities-containing amorphous silicon layer. The design aims to suppress photoexcited current and improve the aperture ratio in display devices.

Career Highlights

Katoh is associated with Sakai Display Products Corporation, where he has been instrumental in advancing display technologies. His work has not only contributed to the company's success but has also positioned him as a key figure in the semiconductor industry.

Collaborations

Hisayuki Katoh has collaborated with notable colleagues, including Hiroyuki Ohta and Shogo Sako. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hisayuki Katoh's contributions to thin-film transistor technology exemplify the impact of innovative thinking in the semiconductor field. His work continues to influence advancements in display technology, showcasing the importance of inventors in driving progress.