Himeji, Japan

Hisato Ishikuro

This inventor holds 1 USPTO granted patent. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Mitsubishi Jidosha Kogyo Kabushiki Kaisha. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisato Ishikuro. Retrieved from https://idiyas.com/inventor/hisato-ishikuro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1991

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hisato Ishikuro: Innovator in Vortex Flow Measurement

Introduction

Hisato Ishikuro is a notable inventor based in Himeji, Japan. He has made significant contributions to the field of fluid measurement technology. His innovative approach has led to the development of a unique vortex flowmeter.

Latest Patents

Hisato Ishikuro holds a patent for a vortex flowmeter designed to measure the flow rate of fluids in conduits. The invention features a member for disturbing the fluid flow, which is strategically placed upstream of a vortex generating column. This design facilitates the generation of vortexes while minimizing fluctuations, ensuring accurate measurements.

Career Highlights

Throughout his career, Ishikuro has worked with prominent companies, including Mitsubishi Electric Corporation and Mitsubishi Motors Corporation. His experience in these organizations has contributed to his expertise in fluid dynamics and measurement technologies.

Collaborations

Ishikuro has collaborated with esteemed colleagues such as Yasuo Tada and Yoshihiko Tanimura. Their combined efforts have further advanced the field of fluid measurement.

Conclusion

Hisato Ishikuro's contributions to vortex flow measurement technology exemplify his innovative spirit and dedication to engineering. His work continues to influence the industry and improve fluid measurement accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…