Himeji, Japan

Hisato Funabiki

This inventor holds 1 USPTO granted patent. Top assignees: Figaro Engineering Inc., Other. Active years: 1995.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal1 out of 46 
 
Figaro Engineering Inc.
 patents
silverMedal1 out of 834,350 
Other
 patents
where one patent can have more than one assignee

Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Hisato Funabiki: Innovator in Silica Mask Production

Introduction

Hisato Funabiki is a notable inventor based in Himeji, Japan. He has made significant contributions to the field of material science, particularly in the production of silica masks on metal oxide surfaces. His innovative methods have implications for various applications in technology and engineering.

Latest Patents

His most recent patent is titled "Method for producing a silica mask on metal oxide surface." This patent describes a novel approach where benzaldehyde is adsorbed on a neutral or weak alkaline metal oxide surface. Following this, tetra-methoxy silane is deposited, which is then hydrolyzed by water vapor into silica. The adsorbed benzaldehyde is subsequently removed by ammonia, resulting in a silica mask with vacancies that serve as adsorption sites for shape-selective adsorption. This method showcases his ingenuity in enhancing material properties.

Career Highlights

Throughout his career, Funabiki has worked with various companies, including Figaro Engineering Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in material science. His work has garnered attention for its practical applications and innovative techniques.

Collaborations

Funabiki has collaborated with notable colleagues such as Nobuaki Kodakari and Miki Niwa. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise in their respective fields.

Conclusion

Hisato Funabiki is a distinguished inventor whose work in silica mask production exemplifies innovation in material science. His contributions continue to influence the industry and inspire future advancements.

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