Hisatake Sano

Title: Hisatake Sano: Innovator in Lithography Technology

Introduction

Hisatake Sano is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of lithography technology, holding a total of 2 patents. His work focuses on developing advanced imprint molds and transfer masks that enhance processing accuracy in various lithography applications.

Latest Patents

His latest patents include an innovative imprint mold that features a substrate of transparent material. This mold has a first principal surface with a pattern region and a second principal surface. It incorporates a first light shielding film on the first principal surface and a second light shielding film on the second principal surface, designed to optimize light curing for transfer layers. Another notable patent is related to a transfer mask blank and method, aimed at improving the manufacturing process of charged-particle beam lithography masks, X-ray lithography masks, and extreme ultraviolet beam lithography masks. This invention utilizes existing writers, such as electron beam writers, to enhance the accuracy of mask patterns.

Career Highlights

Hisatake Sano is associated with Dai Nippon Printing Co., Ltd., where he continues to push the boundaries of lithography technology. His expertise and innovative approach have positioned him as a key figure in the industry.

Collaborations

Throughout his career, Sano has collaborated with notable colleagues, including Yuki Aritsuka and Morihisa Hoga. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Hisatake Sano's contributions to lithography technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, paving the way for future innovations.