Location History:
- Tsuruoka, JP (2010)
- Tama, JP (2014)
Company Filing History:
Years Active: 2010-2014
Title: Hisashi Tazawa: Innovator in CVD Film Technology
Introduction
Hisashi Tazawa is a prominent inventor based in Tama, Japan. He has made significant contributions to the field of chemical vapor deposition (CVD) technology, particularly in the development of methods for forming low-carbon films. With a total of 2 patents to his name, Tazawa continues to push the boundaries of innovation in his field.
Latest Patents
Tazawa's latest patents include two groundbreaking methods. The first patent is titled "Method for forming low-carbon CVD film for filling trenches." This method involves introducing a silicon-containing compound with three or fewer hydrocarbon units into a substrate with trenches. By applying RF power and controlling the substrate temperature, Tazawa's method allows for the effective filling of trenches with a low-carbon silicon-containing film.
The second patent is "Method for depositing flowable material using alkoxysilane or aminosilane precursor." This innovative approach focuses on filling recesses with an insulation film. It involves introducing a precursor that does not contain Si—C or C—C bonds into a reaction chamber. The process allows for the deposition of a flowable Si-containing insulation film on irregular surfaces, effectively filling recesses through plasma reaction at temperatures ranging from -50°C to 100°C.
Career Highlights
Hisashi Tazawa is currently employed at ASM Japan K.K., where he continues to develop advanced technologies in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of CVD processes.
Collaborations
Tazawa collaborates with talented individuals in his field, including coworkers Atsuki Fukazawa and Jeongseok Ha. Their combined expertise contributes to the innovative environment at ASM Japan K.K.
Conclusion
Hisashi Tazawa is a key figure in the advancement of CVD film technology. His innovative methods and dedication to research continue to impact the semiconductor industry positively.