Kumamoto, Japan

Hisashi Ohta

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Advanced Display. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Ohta. Retrieved from https://idiyas.com/inventor/hisashi-ohta-eunp0vzu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Hisashi Ohta: Inventor of a Stress-Resistant Display Device.

Introduction

Hisashi Ohta is an inventor associated with Kumamoto, Japan, and Kabushiki Kaisha Advanced Display. His work includes a patent for a display device designed to help protect image quality from external stress.

Latest Patents

Ohta is credited with 1 patent. His patent, “Display device,” describes a liquid crystal panel for displaying images and characters, paired with an illuminator that projects light from behind the panel. A mold frame and a front frame support these components. The mold frame includes mounting holes for attaching the device to an external device, such as a personal computer, and corner cutouts intended to absorb stress transmitted through the mounting holes. This design aims to reduce deterioration in display quality caused by external stress.

Career Highlights

Ohta’s documented patent work focuses on display-device construction and the protection of liquid crystal display quality. The patent identifies Kabushiki Kaisha Advanced Display as his associated company.

Collaborations

Hisashi Ohta’s listed coworkers include Kazutoshi Shimojo and Masayuki Kawano.

Conclusion

Hisashi Ohta’s patent reflects a practical approach to improving display durability by incorporating stress-absorbing features into the device’s frame.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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