Yokkaichi, Japan

Hisashi Masumoto

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Jsp Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Masumoto. Retrieved from https://idiyas.com/inventor/hisashi-masumoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hisashi Masumoto: Innovator in Polypropylene-Based Resin Technology

Introduction

Hisashi Masumoto is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative resin technologies. His work has led to advancements that are beneficial in various industrial applications.

Latest Patents

Masumoto holds a patent for "Polypropylene-based resin expanded beads and molded article thereof." This invention involves an expanded bead of polypropylene-based resin that features a through hole defined by an inner peripheral surface, with an average hole diameter of 1 mm or less. The expanded bead boasts a closed cell content of 85% or more, an average cell diameter ranging from 50 to 300 μm, and an inner surface portion that extends along the inner peripheral surface, which has an average cell diameter of 5 to 150 μm, smaller than that of the expanded bead.

Career Highlights

Masumoto is currently associated with JSP Corporation, where he continues to innovate and develop new materials. His expertise in resin technology has positioned him as a key figure in the industry, contributing to the advancement of sustainable and efficient materials.

Conclusion

Hisashi Masumoto's work in polypropylene-based resin technology exemplifies the impact of innovative thinking in material science. His contributions not only enhance industrial applications but also pave the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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