Company Filing History:
Years Active: 1994-1999
Title: Hisashi Hori: Innovator in Plasma Processing Technology
Introduction
Hisashi Hori is a notable inventor based in Kanagawa, Japan, recognized for his contributions to plasma processing technology. With a total of three patents to his name, Hori has made significant advancements in the field, particularly in the design and functionality of processing apparatuses.
Latest Patents
Hori's latest patents include a processing apparatus for substrates and a plasma processing apparatus. The processing apparatus for substrates focuses on reducing the time required to introduce an inactive gas, such as nitrogen, into a load lock chamber. This is achieved by incorporating a buffer tank with a larger capacity than the load lock chamber, allowing for efficient gas introduction during processing. The plasma processing apparatus features first and second electrodes arranged around a tubular chamber to generate plasma. Each electrode consists of web-shaped segments that are strategically spaced and connected to insulators, enhancing the efficiency of the plasma generation process.
Career Highlights
Throughout his career, Hisashi Hori has worked with prominent companies, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative processing technologies.
Collaborations
Hori has collaborated with notable colleagues such as Kazuto Ohbuchi and Atsushi Matsushita, further enriching his work in the field of plasma processing.
Conclusion
Hisashi Hori's innovative contributions to plasma processing technology and his successful career in leading companies highlight his importance as an inventor. His patents reflect a commitment to advancing technology in the industry.