Hitachiota, Japan

Hisao Oonuki


Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Hitachi, JP (1993)
  • Hitachiohta, JP (1998)
  • Hitachiota, JP (2001)

Company Filing History:


Years Active: 1993-2001

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3 patents (USPTO):Explore Patents

Title: Hisao Oonuki: Innovator in Ion Beam Processing Technology

Introduction

Hisao Oonuki, an accomplished inventor based in Hitachiota, Japan, holds three notable patents that reflect his expertise in the field of ion beam processing technology. His work primarily focuses on enhancing the operability and efficiency of ion beam applications, making significant contributions to the industry.

Latest Patents

Oonuki's latest patents reveal innovative solutions aimed at improving operational efficiency. One of his key inventions, the Ion Beam Processing Apparatus, is designed to reduce the movement of operators, thereby enhancing user operability. This apparatus features a vacuum chamber with a door on the front side, connected to sample holders through a rotation shaft and disk. The design includes a detachably mounted ion source on the right side and a control panel on the left, with the vacuum chamber door supported by a linearly reciprocally-moving mechanism for ease of access.

Another significant invention is related to the collection of ions in a neutralized plasma environment. In this design, a cylindrical electrode is set at a negative potential against the processing chamber, facilitating the collection of ions in the neutralized plasma. This system allows for an efficient spread of the ion collection area and ensures that a sufficient volume of ions and electrons are collected simultaneously, even from low-density plasma.

Career Highlights

Hisao Oonuki is associated with Hitachi, Ltd., a leading company known for its technological advancements and innovative solutions. His contributions have played a vital role in expanding the capabilities of ion beam processing technologies, marking him as a significant figure in this field.

Collaborations

Throughout his career, Oonuki has collaborated with notable colleagues such as Shotaro Ooishi and Isao Hashimoto. Their combined efforts have fostered an environment of innovation, leading to the development of advanced technologies in ion beam processing.

Conclusion

Hisao Oonuki’s work exemplifies the spirit of innovation and the quest for improved technology in manufacturing processes. His patents not only demonstrate his technical prowess but also contribute to advancements in the field, showcasing the impact of dedicated inventors working in collaboration with renowned companies like Hitachi, Ltd.

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