Okayama, Japan

Hisao Odashima

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 2000-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisao Odashima. Retrieved from https://idiyas.com/inventor/hisao-odashima-7lk8it9a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 2000-2003

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2 patents (USPTO):Explore Patents

Title: Hisao Odashima: Innovator in Metal Surface Treatment

Introduction

Hisao Odashima is a notable inventor based in Okayama, Japan. He has made significant contributions to the field of metal surface treatment, holding a total of 2 patents. His work focuses on developing innovative solutions that enhance the properties of metal materials.

Latest Patents

His latest patents include an agent for treating metallic surfaces and a chromium-free metal surface-treating composition. The first patent details a composition that comprises a hydroxyl group-containing organic resin, phosphoric acid, and various metal ions and compounds. The second patent describes a chromium-free composition for treating metal surfaces, which includes a coating film of the chromium-free composition and an optional coating film of an organic resin.

Career Highlights

Hisao Odashima is associated with Toyo Boseki Kabushiki Kaisha, where he has been instrumental in advancing metal treatment technologies. His innovative approaches have positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers such as Toshiyuki Shimizu and Tomomi Takahashi, contributing to various projects that enhance the effectiveness of metal treatments.

Conclusion

Hisao Odashima's work in metal surface treatment showcases his dedication to innovation and improvement in material science. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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