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For the Inventor, By the Inventor

Shiga, Japan

Hisao Nishizawa

This inventor holds 8 USPTO granted patents. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1986-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisao Nishizawa. Retrieved from https://idiyas.com/inventor/hisao-nishizawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 2.5

ph-index = 8

Forward Citations = 341(Granted Patents)


Location History:

  • Inugami, JP (1986)
  • Hikone, JP (1992 - 1994)
  • Shiga, JP (1989 - 1999)

Company Filing History:

goldMedal8 out of 1,306 
 
Dainippon Screen Mfg. Co., Ltd.
 patents

Years Active: 1986-1999

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8 patents (USPTO):Explore Patents
1. 5888344 - Method of and an apparatus for processing a substrate (1999-03-30),
2. 5704493 - Substrate holder (1998-01-06),
3. 5288333 - Wafer cleaning method and apparatus therefore (1994-02-22),
4. 5275184 - Apparatus and system for treating surface of a wafer by dipping the same (1994-01-04),
5. 5158100 - Wafer cleaning method and apparatus therefor (1992-10-27),
6. 4871417 - Method and apparatus for surface treating of substrates (1989-10-03),
7. 4811443 - Apparatus for washing opposite surfaces of a substrate (1989-03-14),
8. 4569717 - Method of surface treatment (1986-02-11),

Title: **Innovative Contributions of Hisao Nishizawa**

Introduction

Hisao Nishizawa, based in Shiga, Japan, is a prolific inventor known for his significant contributions in the field of substrate processing technology. With a remarkable portfolio of eight patents, his inventions have revolutionized various aspects of semiconductor manufacturing.

Latest Patents

Nishizawa's latest patent focuses on a method and apparatus for processing a substrate. This innovative substrate processing apparatus prevents sudden boiling of the supplementary liquid, ensuring a consistent temperature within the processing liquid. It employs a de-ionized water injection nozzle to distribute de-ionized water uniformly into a phosphoric acid solution. This technology minimizes direct evaporation, thus maintaining the essential temperature of the phosphoric acid solution and enhancing processing efficiency. Additionally, his design of the substrate holder, which features a unique arrangement of bridges and notches, allows semiconductor substrates to be dipped in processing liquids with minimal contact, promoting rapid drying and efficient operation.

Career Highlights

Hisao Nishizawa has spent a significant part of his career working at Dainippon Screen Mfg. Co., Ltd. Here, he has led various innovative projects that have positioned the company as a leader in semiconductor processing equipment. His work has not only influenced product development but has also set higher standards for substrate processing techniques in the industry.

Collaborations

In his journey as an inventor, Nishizawa has collaborated with notable colleagues, including Masato Tanaka and Nobuyuki Hirai. Together, they have pushed the boundaries of semiconductor technology, illustrating the power of teamwork in achieving groundbreaking results.

Conclusion

Hisao Nishizawa's contributions to substrate processing are invaluable, with his latest patents marking significant advancements in technology. As he continues to innovate at Dainippon Screen Mfg. Co., Ltd., his work remains a testimony to the impact of passionate inventors in the realm of engineering and technology. His dedication and ingenuity undoubtedly pave the way for future innovations in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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