Hitachi, Japan

Hisao Nakayama

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Hitachi Information & Control Solutions, Ltd.. Active years: 2008-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisao Nakayama. Retrieved from https://idiyas.com/inventor/hisao-nakayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2008-2009

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2 patents (USPTO):Explore Patents

Title: Hisao Nakayama: Innovator in Biometrics Technology

Introduction

Hisao Nakayama is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of biometrics, showcasing his expertise through his innovative patents. With a total of 2 patents, Nakayama has established himself as a key figure in technological advancements.

Latest Patents

One of Hisao Nakayama's latest inventions is a biometrics input unit. This technology aims to enhance the efficiency and security of biometric data collection, reflecting his commitment to innovation in this critical area.

Career Highlights

Nakayama is currently employed at Hitachi Information & Control Solutions, Ltd., where he continues to develop cutting-edge technologies. His work at this esteemed company has allowed him to push the boundaries of what is possible in the realm of biometrics.

Collaborations

Throughout his career, Nakayama has collaborated with talented individuals such as Hiroyuki Noda and Kichiro Kikuchi. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Hisao Nakayama's contributions to biometrics technology exemplify his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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