Tokyo, Japan

Hisanori Hayano

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisanori Hayano. Retrieved from https://idiyas.com/inventor/hisanori-hayano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hisanori Hayano: Innovator in Vacuum Processing Technology

Introduction

Hisanori Hayano is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of vacuum processing technology. His innovative approach has led to the development of a unique method for detecting objects in vacuum processing apparatuses.

Latest Patents

Hisanori Hayano holds a patent for an "Objects Detecting Method for Vacuum Processing Apparatus." This patent describes a method that enhances the efficiency of processing wafers in a vacuum environment. The method involves increasing the internal pressure of a transfer chamber to generate a gas flow, allowing for the effective transfer and detection of objects adhering to the wafer's surface.

Career Highlights

Hisanori Hayano is associated with Hitachi High-Tech Corporation, where he has made significant strides in advancing vacuum processing technologies. His work has been instrumental in improving the reliability and performance of vacuum processing systems.

Collaborations

Hisanori has collaborated with notable colleagues, including Takaharu Kinoshita and Tomoyuki Watanabe. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Hisanori Hayano's innovative work in vacuum processing technology exemplifies the impact of dedicated inventors in advancing industrial applications. His contributions continue to influence the field and enhance the capabilities of vacuum processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…