Osaka, Japan

Hisanao Kajiura

This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Works, Ltd.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisanao Kajiura. Retrieved from https://idiyas.com/inventor/hisanao-kajiura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 13.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Hisanao Kajiura: Innovator in Resin Coating Technology

Introduction

Hisanao Kajiura is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of resin coating technology. His work has been recognized for its innovative approach and practical applications in various industries.

Latest Patents

Hisanao Kajiura holds a patent for a "Process for resin-coating of resin moldings, resin-coating apparatus for." This patent showcases his expertise in developing efficient methods for applying resin coatings, which are essential in enhancing the durability and functionality of resin products. He has 1 patent to his name.

Career Highlights

Kajiura has had a distinguished career at Matsushita Electric Works, Ltd., where he has been instrumental in advancing resin coating technologies. His work has contributed to the company's reputation for innovation and quality in the electronics and manufacturing sectors.

Collaborations

Throughout his career, Kajiura has collaborated with talented individuals such as Keiji Higashi and Koichi Uesaki. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Hisanao Kajiura's contributions to resin coating technology exemplify the impact of innovative thinking in the field of manufacturing. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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