Kasugai, Japan

Hisamitsu Maekawa

This inventor holds 1 USPTO granted patent. Top assignees: Ckd Corporation, Hitachi, Ltd.. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisamitsu Maekawa. Retrieved from https://idiyas.com/inventor/hisamitsu-maekawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 92(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Hisamitsu Maekawa: Innovator in Spin Coating Technology

Introduction

Hisamitsu Maekawa is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of spin coating technology, particularly with his innovative apparatus designed to enhance the precision of liquid feeding processes.

Latest Patents

His most recent patent is a spin coating apparatus that addresses critical issues in the feeding of clean liquids. The invention focuses on eliminating foreign matter and air bubbles from the feed liquid, which can lead to nonuniformity in feed speed and amount. By incorporating automatic sensing and exclusion mechanisms, as well as precise control elements like pumps, Maekawa's invention ensures a constant amount of clean liquid is fed at a fixed rate.

Career Highlights

Throughout his career, Maekawa has worked with prominent companies such as Hitachi, Ltd. and Ckd Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Some of his notable coworkers include Haruo Amada and Akihiro Kojima. Their collaboration has likely fostered an environment of innovation and creativity in their respective fields.

Conclusion

Hisamitsu Maekawa's contributions to spin coating technology exemplify the importance of innovation in enhancing manufacturing processes. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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