Hisako Aoyama is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the fields of chemical solutions and semiconductor manufacturing. With a total of 7 patents to her name, Aoyama has established herself as a key figure in innovation.

Latest Patents

Aoyama's latest patents include a method for filtering chemicals and a method for detecting defects originating from chemical solutions. The filtering method involves a process where a first chemical stored in a tank is filtered, and the resulting second chemical is stored in another tank. This method includes adding capture amounts of the first chemicals and comparing them to a predetermined limit to determine when to exchange the filter. Additionally, her defect detection method involves coating a chemical solution on a mask and using an exposure beam to perform inspections on a resist film, ensuring that the results meet predetermined standards.

Career Highlights

Hisako Aoyama is currently employed at Kabushiki Kaisha Toshiba, where she continues to innovate and develop new technologies. Her work has been instrumental in advancing the capabilities of chemical processing and semiconductor manufacturing.

Collaborations

Aoyama has collaborated with notable colleagues such as Kyoichi Suguro and Hiromi Niiyama. These partnerships have contributed to her success and the advancement of her projects.

Conclusion

Hisako Aoyama's contributions to the fields of chemical solutions and semiconductor manufacturing highlight her innovative spirit and dedication to advancing technology. Her patents and collaborations reflect her significant impact on the industry.

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