Hitachi, Japan

Hisakithi Onodera

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1985.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Hisakithi Onodera: Innovator in Semiconductor Technology

Introduction

Hisakithi Onodera is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the efficiency and effectiveness of semiconductor devices.

Latest Patents

Hisakithi Onodera holds 1 patent for a semiconductor device. This patent discloses a solder joint between a semiconductor substrate and an electrode. The principal surface of the semiconductor substrate, where an n-type semiconductor layer is exposed, is bonded to the electrode using brazing solder. The brazing solder consists of aluminum solder on the side of the semiconductor substrate and copper solder on the side of the electrode. This innovative approach allows for solid phase adhesion between aluminum and copper at temperatures below the eutectic temperature of 548°C. As a result, the semiconductor substrate can be soldered to the electrode at lower temperatures, enhancing the manufacturing process.

Career Highlights

Hisakithi Onodera is currently employed at Hitachi, Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative mindset have positioned him as a valuable asset to his team.

Collaborations

Throughout his career, Onodera has collaborated with talented individuals such as Jin Onuki and Ko Soeno. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Hisakithi Onodera's contributions to semiconductor technology exemplify the importance of innovation in the field. His patent on solder joints demonstrates a significant advancement that can lead to more efficient manufacturing processes. His work continues to inspire future developments in semiconductor devices.

Profile summary based on public USPTO records.
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