Wakayama, Japan

Hisahiro Maeda

This inventor holds 2 USPTO granted patents. Top assignee: Noritsu Koki Co., Ltd.. Active years: 1995-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisahiro Maeda. Retrieved from https://idiyas.com/inventor/hisahiro-maeda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.8

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1995-1998

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2 patents (USPTO):Explore Patents

Title: Hisahiro Maeda: Innovator in Photographic Technology

Introduction

Hisahiro Maeda is a notable inventor based in Wakayama, Japan. He has made significant contributions to the field of photographic technology, holding a total of 2 patents. His work has been instrumental in advancing the capabilities of photographic printing apparatuses.

Latest Patents

Maeda's latest patents include a "Photographic printing apparatus with exposure position rectifying" and a "Method and apparatus for automatically adjusting lens in automatic." These innovations reflect his commitment to enhancing the efficiency and quality of photographic processes.

Career Highlights

Maeda is currently employed at Noritsu Koki Co., Ltd., a company renowned for its expertise in imaging technology. His role at Noritsu has allowed him to focus on developing cutting-edge solutions that cater to the evolving needs of the photographic industry.

Collaborations

Throughout his career, Maeda has collaborated with talented individuals such as Hiroshi Miyawaki and Mitsuhiko Itojima. These partnerships have fostered a creative environment that has led to the development of innovative technologies.

Conclusion

Hisahiro Maeda's contributions to photographic technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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