Kawasaki, Japan

Hisaaki Oguri

This inventor holds 2 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2003-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisaaki Oguri. Retrieved from https://idiyas.com/inventor/hisaaki-oguri

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003-2006

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2 patents (USPTO):Explore Patents

Title: Hisaaki Oguri: Innovator in Position Detection Technology

Introduction

Hisaaki Oguri is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of position detection technology, holding 2 patents that showcase his innovative approach to measurement devices.

Latest Patents

Oguri's latest patents include a position detection apparatus having a plurality of detection sections and an exposure apparatus. This surface position detection apparatus features a position detection section with multiple electrodes that oppose the object surface to be measured. The measurement device selects at least one electrode based on the shape of the object surface, supplies an AC current to the selected electrode, and measures the current flowing to it. This process allows for accurate measurement of the distance between the electrode and the object surface.

Career Highlights

Hisaaki Oguri is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop and refine his inventions, contributing to advancements in technology.

Collaborations

Oguri has collaborated with notable coworkers such as Toyoshige Sasaki and Masanobu Hasegawa. Their combined expertise has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Hisaaki Oguri's contributions to position detection technology exemplify his dedication to innovation. His patents reflect a deep understanding of measurement techniques that are essential in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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