San Jose, CA, United States of America

Hiroyuki Steven Tomosawa

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1997-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Steven Tomosawa. Retrieved from https://idiyas.com/inventor/hiroyuki-steven-tomosawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 132(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Hiroyuki Steven Tomosawa

Introduction

Hiroyuki Steven Tomosawa, based in San Jose, California, is a notable inventor recognized for his contributions to the field of plasma processing technologies. With two patents to his name, his innovative work focuses on enhancing the longevity and effectiveness of metal surfaces in challenging environments.

Latest Patents

Tomosawa's latest patents include a breakthrough in ceramic protection for heated metal surfaces in plasma processing chambers. His invention provides non-bonded ceramic protection designed to shield metal surfaces, especially heated electrode surfaces, from chemical aggressors present in plasma during material processing. This innovative approach employs a thin cover material that fits closely to the heated metal without forming a bond, allowing for effective protection. The specific ceramic materials utilized in this protection system include aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide. Such advancements are particularly beneficial for safeguarding glow discharge electrodes and gas distribution apparatus in semiconductor substrate processing to form integrated circuit structures.

Career Highlights

Tomosawa's work is primarily associated with Applied Materials, Inc., a leader in providing innovative solutions for the semiconductor-manufacturing industry. His dedication to improving plasma processing technologies reflects his significant role in advancing the capabilities of semiconductor fabrication processes.

Collaborations

Throughout his career, Tomosawa has collaborated with esteemed colleagues, including Charles N. Dornfest and John M. White. Their combined efforts in research and development have contributed to the refinement and practicality of plasma processing techniques, showcasing the collaborative spirit in the field of innovation.

Conclusion

Hiroyuki Steven Tomosawa stands as a prominent figure in the realm of inventions, with patents that significantly impact plasma processing technologies. His inventive spirit and commitment to innovation not only enhance manufacturing processes but also pave the way for future discoveries in this critical sector of the technology industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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