Ibaraki, Japan

Hiroyuki Otsuka


Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 46(Granted Patents)


Location History:

  • Ushiku, JP (1992)
  • Ibaraki, JP (2005)

Company Filing History:


Years Active: 1992-2005

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2 patents (USPTO):

Title: **Hiroyuki Otsuka: Innovating the Future of Semiconductor Technologies**

Introduction

Hiroyuki Otsuka, an accomplished inventor based in Ibaraki, Japan, has contributed significantly to the field of semiconductor technologies. With a portfolio of two patents, Otsuka's latest innovations focus on enhancing the precision and efficiency of fabrication methods essential for the production of electronic devices.

Latest Patents

Hiroyuki Otsuka's latest patents reflect his expertise in advanced fabrication techniques. The first patent, titled "Fabrication Method for Electron Source Substrate," introduces a novel method involving a measurement step that ensures precise positioning of a substrate equipped with pairs of electrodes. By using an ink-jet head for discharging droplets of electroconductive thin-film material, the method optimizes the precision of the substrate and the discharge process, improving the overall fabrication of electron sources.

The second patent is a "Stage Positioning Control Method and Apparatus," which details a sophisticated control system for positioning an X-ray stage critical in semiconductor wafer processing. This invention enables accurate movement and tilting of the wafer, addressing potential positioning errors that may arise during production. By integrating a laser interferometer for real-time monitoring, Otsuka's invention enhances the reliability of semiconductor manufacturing processes.

Career Highlights

Hiroyuki Otsuka is a significant asset to Canon Kabushiki Kaisha, a leading company renowned for its cutting-edge innovations in imaging and information technology. His work not only advances the technical capabilities of semiconductor equipment but also contributes to Canon's mission of leading technological evolution in the industry.

Collaborations

Otsuka collaborates with notable colleagues, including Kotaro Hosaka and Makoto Higomura. Their combined expertise fosters a dynamic environment of innovation, driving the development of advanced technologies in the competitive landscape of semiconductor manufacturing.

Conclusion

Hiroyuki Otsuka's contributions to the field of semiconductor technologies through his innovative patents are a testament to his skill and vision as an inventor. His work at Canon Kabushiki Kaisha, along with his collaborations, promises to accelerate advancements in semiconductor fabrication, positioning him as a key player in shaping the future of electronics.

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