Sulta-City, Osaka 564-0044, Japan

Hiroyuki Onari


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:

goldMedal1 out of 832,718 
Other
 patents

Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Onari: Innovator in Substrate-Cutting Technology

Introduction

Hiroyuki Onari is a notable inventor based in Sulta-City, Osaka, Japan. He has made significant contributions to the field of substrate-cutting technology. His innovative approach has led to the development of a unique substrate-cutting system that enhances efficiency in manufacturing processes.

Latest Patents

Hiroyuki Onari holds 1 patent for his invention titled "Substrate-cutting system, substrate-producing apparatus, substrate-scribing method, and substrate-cutting method." This patent describes a clamping device installed on a stand with a hollow rectangular parallelepiped shape. The device is designed to clamp at least one side edge portion of a mother substrate during transport. It features a pair of substrate-cutting devices that cut the mother substrate from both its upper and lower faces. The scribing device guide body is reciprocally movable along one side of the stand, allowing for precise cutting operations.

Career Highlights

Throughout his career, Hiroyuki Onari has demonstrated a commitment to innovation and excellence in his field. His work has not only advanced substrate-cutting technology but has also contributed to the efficiency of production processes in various industries.

Collaborations

Hiroyuki Onari has collaborated with notable colleagues, including Yoshitaka Nishio and Yasutomo Okajima. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Hiroyuki Onari's contributions to substrate-cutting technology exemplify the impact of innovative thinking in manufacturing. His patent reflects a significant advancement in the field, showcasing his dedication to improving production efficiency.

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