Otsu, Japan

Hiroyuki Okamura

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Electric Glass Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Okamura. Retrieved from https://idiyas.com/inventor/hiroyuki-okamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Okamura: Innovator in Refractory Materials

Introduction

Hiroyuki Okamura is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of refractory materials, particularly through his innovative patent. His work is recognized for its practical applications in various industries.

Latest Patents

Hiroyuki Okamura holds a patent for a refractory filler, sealing material using the same, and a manufacturing method for refractory filler. This patent describes a manufacturing method that involves melting a raw material batch and cooling the resultant melt to precipitate willemite as the main crystal phase. This innovation enhances the efficiency and effectiveness of refractory materials.

Career Highlights

Okamura is associated with Nippon Electric Glass Co., Ltd., where he has been instrumental in advancing the company's research and development efforts. His expertise in refractory materials has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Hiroyuki Okamura has collaborated with talented individuals such as Tomoko Enomoto and Nobutoshi Ito. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Hiroyuki Okamura's contributions to refractory materials through his patent and work at Nippon Electric Glass Co., Ltd. highlight his role as an influential inventor in the field. His innovative approach continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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