Chiba, Japan

Hiroyuki Oiwa

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Glass Company, Limited. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Oiwa. Retrieved from https://idiyas.com/inventor/hiroyuki-oiwa-4rdsef36

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Oiwa: Innovator in Glass Forming Technology

Introduction

Hiroyuki Oiwa is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of glass forming technology. His innovative approach has led to the development of a unique glass forming mold that enhances the manufacturing process.

Latest Patents

Hiroyuki Oiwa holds 1 patent for a glass forming mold. This mold comprises a molding surface, a chromium coating film formed on the molding surface, and a silicon oxide film formed on the surface of the chromium coating film. This invention represents a significant advancement in the efficiency and quality of glass production.

Career Highlights

Oiwa is currently employed at Asahi Glass Company, Limited, a leading company in the glass manufacturing industry. His work at Asahi Glass has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for quality and innovation.

Collaborations

Throughout his career, Hiroyuki Oiwa has collaborated with talented individuals such as Toshihiro Ohashi and Yuichi Yamamoto. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in glass technology.

Conclusion

Hiroyuki Oiwa's contributions to glass forming technology exemplify the impact of innovation in manufacturing. His patent for a glass forming mold showcases his commitment to enhancing production processes. Oiwa's work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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