Tokyo, Japan

Hiroyuki Noritsune

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Noritsune. Retrieved from https://idiyas.com/inventor/hiroyuki-noritsune

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Noritsune: Innovator in Electronic Device Design

Introduction

Hiroyuki Noritsune is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of electronic devices. With a focus on enhancing operational efficiency, Noritsune has developed a unique approach to electronic device design.

Latest Patents

Noritsune holds a patent for an electronic device that simplifies the manufacturing process. This invention eliminates the need for complex machining operations to reduce the wall thickness of a case. The design ensures that the wall thickness can be set at an appropriate level, thereby improving the efficiency of connector mounting. The electronic device features a case with a dish-shaped sectional configuration, an opening, and a recess formed in the side wall. A connector is fit-engaged with this recess, and an electronic circuit board is housed within the case.

Career Highlights

Hiroyuki Noritsune is associated with Mitsubishi Electric Corporation, where he has made significant strides in electronic device innovation. His work has contributed to advancements in the efficiency and functionality of electronic devices.

Collaborations

Noritsune collaborates with Hisanori Nobe, a fellow innovator, to further enhance their contributions to the field of electronics.

Conclusion

Hiroyuki Noritsune's innovative work in electronic device design exemplifies the importance of efficiency in technology. His patent reflects a commitment to simplifying manufacturing processes while maintaining high operational standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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