Location History:
- Osaka, JP (2014)
- Tokyo, JP (1991 - 2016)
Company Filing History:
4 out of 94 
2 out of 67 
2 out of 58,132 
Years Active: 1991-2016
Title: The Innovations of Hiroyuki Matsuyama
Introduction
Hiroyuki Matsuyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced stainless steel and semiconductor processing techniques. With a total of nine patents to his name, Matsuyama's work has had a considerable impact on various industries.
Latest Patents
One of Matsuyama's latest patents is for a high purity ferritic stainless steel sheet that excels in corrosion resistance and anti-glare properties. This innovative alloy-saving type steel sheet contains specific percentages of carbon, silicon, manganese, phosphorus, sulfur, chromium, nitrogen, aluminum, and tin, with a balance of iron and unavoidable impurities. The surface film of this steel sheet is designed to enhance its performance, featuring a unique composition that improves its durability and functionality. Another notable patent involves a method for removing the oxide film formed on the surface of silicon wafers. This method includes a series of steps that utilize a vapor-phase etching apparatus to effectively clean the silicon wafer, ensuring optimal performance in semiconductor applications.
Career Highlights
Throughout his career, Matsuyama has worked with reputable companies such as Pola Chemical Industries, Inc. and Nippon Steel & Sumikin Stainless Steel Corporation. His experience in these organizations has allowed him to refine his expertise in materials engineering and innovation.
Collaborations
Matsuyama has collaborated with notable colleagues, including Hirofumi Katada and Masaharu Hatano. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Hiroyuki Matsuyama's contributions to the field of materials science and semiconductor processing are noteworthy. His innovative patents and collaborations reflect his dedication to advancing technology and improving industrial applications.