This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Hiroyuki Kume: Innovator in Siloxane Compounds
Introduction
Hiroyuki Kume is a notable inventor based in Annaka, Japan. He has made significant contributions to the field of siloxane compounds, particularly through his innovative work at Shin-Etsu Chemical Co., Ltd. His expertise in this area has led to the development of unique materials with various applications.
Latest Patents
Hiroyuki Kume holds a patent for (meth)acrylic-modified siloxane compounds. This patent describes a siloxane compound that is modified at one end with at least one (meth)acrylic group via a spacer. The spacer can be a straight chain with at least three ether bonds or a branched structure with at least one ether bond. The resulting (meth)acrylic-modified siloxane compound is incorporated into heat or photo-curable compositions, which cure into products that exhibit water-repellent, antifouling, lubricating, and other properties inherent to siloxane. He has 1 patent to his name.
Career Highlights
Throughout his career, Hiroyuki Kume has been associated with Shin-Etsu Chemical Co., Ltd., where he has played a pivotal role in advancing the company's research and development efforts. His work has not only contributed to the company's portfolio but has also enhanced the understanding of siloxane compounds in various applications.
Collaborations
Hiroyuki Kume has collaborated with esteemed colleagues such as Mamoru Hagiwara and Masahiko Minemura. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the field.
Conclusion
Hiroyuki Kume's contributions to the field of siloxane compounds exemplify the impact of innovative thinking in material science. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
