Tokuyama, Japan

Hiroyuki Kohno


Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 1999-2002

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3 patents (USPTO):Explore Patents

Title: Hiroyuki Kohno: Innovator in Semiconductor Polishing Technologies

Introduction

Hiroyuki Kohno is a notable inventor based in Tokuyama, Japan. He has made significant contributions to the field of semiconductor polishing technologies. With a total of 3 patents to his name, Kohno's work has advanced the methods used in the semiconductor industry.

Latest Patents

Kohno's latest patents include innovative solutions for polishing semiconductor substrates. One of his patents describes an abrasive and method for polishing semiconductor substrates. This method utilizes a polishing agent that comprises silica particles as the main component, water as a solvent, and a water-soluble cellulose. The formulation ensures that the semiconductor wafer is flattened without causing damage to the wafer or the film formed on it, while also preventing dishing problems on the polished surface. Another patent focuses on an abrasive material for polishing semiconductor wafers. This material is created by dispersing silicon nitride particles in a solvent, followed by the addition of an adsorptive that sticks to the abrasive particles. This innovative approach allows for selective polishing of a CVD SiO₂ film relative to the Si₃N₄ film used as a stopper film, enabling efficient flattening without dishing issues.

Career Highlights

Kohno has worked with Tokuyama Corporation, where he has applied his expertise in semiconductor technologies. His contributions have been instrumental in enhancing the efficiency and effectiveness of semiconductor polishing processes.

Collaborations

Throughout his career, Kohno has collaborated with notable colleagues such as Hiroshi Kato and Kazuhiko Hayashi. These collaborations have further enriched his work and innovations in the field.

Conclusion

Hiroyuki Kohno's contributions to semiconductor polishing technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the semiconductor industry and provide effective solutions to enhance manufacturing processes.

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