Yokohama, Japan

Hiroyuki Ishida

This inventor holds 1 USPTO granted patent. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Ishida. Retrieved from https://idiyas.com/inventor/hiroyuki-ishida-78fek33q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Ishida: Innovator in Conductive Technology

Introduction

Hiroyuki Ishida is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of conductive materials, particularly in the development of technologies that enhance signal integrity.

Latest Patents

Ishida holds a patent for a conductive member designed to efficiently attenuate noise with frequency components in the GHz range. This invention utilizes a signal line formed from a first conductive paste that includes silver powder, ferrite powder, an organic binder, a dispersant, and a solvent. His innovative approach addresses critical challenges in electronic signal transmission.

Career Highlights

Hiroyuki Ishida is associated with Koninklijke Philips Corporation N.V., a leading company in technology and innovation. His work at Philips has allowed him to focus on advancing conductive materials and their applications in various electronic devices.

Collaborations

Ishida collaborates with Kenichi Horie, a fellow innovator, to further explore advancements in conductive technologies. Their partnership aims to push the boundaries of what is possible in the field.

Conclusion

Hiroyuki Ishida's contributions to conductive technology exemplify the importance of innovation in enhancing electronic performance. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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