This inventor holds 4 USPTO granted patents. Top assignees: Asahi Kasei Kabushiki Kaisha, Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1996-2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Otsu, JP (1996)
- Ohtsu, JP (2001)
- Shizuoka, JP (2004 - 2006)
Company Filing History:

Years Active: 1996-2006
Title: Innovations by Hiroyuki Hanahata
Introduction
Hiroyuki Hanahata is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of materials science, particularly in the development of coating compositions. With a total of 4 patents to his name, Hanahata's work has had a considerable impact on various industries.
Latest Patents
One of his latest patents is a coating composition for forming low-refractive index thin layers. This composition includes a fluid, silica precursor obtained by subjecting alkoxysilane(s) to hydrolysis and polycondensation in the presence of an acid catalyst. It also features a basic compound with a pH of 11 or more and a vapor pressure of 1.3 kPa or lower at 100°C. Additionally, it incorporates an organic compound with a boiling point of 100°C or higher, which is compatible with the silica precursor. Another significant patent is a coating composition for the production of insulating thin films.
Career Highlights
Hiroyuki Hanahata has worked with prominent companies such as Asahi Kasei and Asahi Kasei Kogyo. His experience in these organizations has allowed him to refine his expertise in material development and innovation.
Collaborations
Throughout his career, Hanahata has collaborated with talented individuals, including Mikihiko Nakamura and Takaaki Ioka. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Hiroyuki Hanahata's contributions to the field of coating compositions demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving materials used in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile