Himeji, Japan

Hiroyuki Goto

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Shokubai Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Goto. Retrieved from https://idiyas.com/inventor/hiroyuki-goto-dns0at39

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Goto: Innovator in Water Absorption Technology

Introduction

Hiroyuki Goto is a notable inventor based in Himeji, Japan. He has made significant contributions to the field of water absorption technology. His innovative work has led to the development of a unique particulate water absorbing agent.

Latest Patents

Hiroyuki Goto holds a patent for a particulate water absorbing agent. The purpose of this invention is to provide a water absorbing agent that possesses both a high water absorption multiplying factor and a high water absorption rate. The patent describes a particulate water absorbing agent with a CRC of 30 to 50 g/g, a weight average particulate diameter (D50) ranging from 200 to 600 µm, and a specific DRC index value.

Career Highlights

Hiroyuki Goto is associated with Nippon Shokubai Co., Ltd., where he has been instrumental in advancing water absorption technologies. His work has garnered attention for its practical applications in various industries.

Collaborations

Hiroyuki has collaborated with notable coworkers, including Kazushi Torii and Mariko Tamaki. Their combined efforts have contributed to the success of their projects and innovations.

Conclusion

Hiroyuki Goto's contributions to the field of water absorption technology exemplify the impact of innovative thinking in solving practical challenges. His patent and work at Nippon Shokubai Co., Ltd. highlight his role as a key inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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