Company Filing History:
Years Active: 1989
Title: Hiroyuki Etoh: Innovator in Semiconductor Technology
Introduction
Hiroyuki Etoh is a prominent inventor based in Kokubunji, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Hiroyuki Etoh holds a patent for a semiconductor device that utilizes a crystalline silicon-germanium-carbon alloy. The invention discloses a semiconductor device comprising a semiconductor layer made of monocrystalline silicon or silicon-germanium alloy, with a silicon-germanium-carbon alloy layer formed thereon. This design ensures that no lattice mismatch occurs between the layers, or if it does, it is only slight, preventing misfit dislocation in the silicon-germanium-carbon alloy layer. He has 1 patent to his name.
Career Highlights
Etoh is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced semiconductor technologies that have practical applications in various electronic devices.
Collaborations
Throughout his career, Hiroyuki Etoh has collaborated with notable colleagues, including Seijiro Furukawa and Akitoshi Ishizaka. These collaborations have contributed to the advancement of semiconductor research and development.
Conclusion
Hiroyuki Etoh's contributions to semiconductor technology exemplify the innovative spirit of modern inventors. His work continues to influence the field and pave the way for future advancements in electronics.