Atsugi, Japan

Hiroyuki Endou

This inventor holds 1 USPTO granted patent. Top assignee: Ricoh Company, Ltd.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Endou. Retrieved from https://idiyas.com/inventor/hiroyuki-endou-u569kg96

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Endou: Innovator in Optical Glass Materials

Introduction

Hiroyuki Endou is a notable inventor based in Atsugi, Japan. He has made significant contributions to the field of optical materials, particularly through his innovative patent related to glass materials for molding optical elements. His work is essential for advancements in optical technology.

Latest Patents

Hiroyuki Endou holds a patent for a glass material designed for molding optical elements. This glass material includes lead and a lead compound, which is processed both chemically and physically. It features a modificative ion component that is set to create a concentration gradient approximated by a specific formula. This innovation is crucial for enhancing the performance of optical elements.

Career Highlights

Endou is associated with Ricoh Company, Ltd., where he has been able to apply his expertise in optical materials. His work has contributed to the company's reputation for innovation in imaging and printing technologies.

Collaborations

Hiroyuki Endou has collaborated with notable colleagues such as Akihito Minato and Hiroshi Ueno. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Hiroyuki Endou's contributions to the field of optical materials through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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