Chuo-ku, Japan

Hiroyasu Tabuchi


Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 14(Granted Patents)


Location History:

  • Chuo-ku, JP (2015 - 2016)
  • Nakano-ku, JP (2020)

Company Filing History:


Years Active: 2015-2020

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3 patents (USPTO):Explore Patents

Title: Hiroyasu Tabuchi: Innovator in Thin Film Technology

Introduction

Hiroyasu Tabuchi is a prominent inventor based in Chuo-ku, Japan. He has made significant contributions to the field of thin film technology, holding a total of 3 patents. His work focuses on enhancing gas barrier properties in various applications, particularly in packaging.

Latest Patents

One of his latest patents is an "Apparatus for forming thin film." This innovative film formation apparatus is designed to create thin films with high gas barrier performance, such as DLC (Diamond Like Carbon) films and SiOx films, on the surfaces of containers like PET bottles. The apparatus includes a vacuum chamber for film formation, a vacuum evacuation device, and a relative shifting device to optimize the process.

Another notable patent is for a "Gas-barrier plastic molded product and manufacturing process therefor." This invention provides a gas barrier plastic molded product that features a gas barrier thin film on its surface. The thin film contains silicon, carbon, oxygen, and hydrogen, with a specific Si content percentage that enhances its gas barrier properties.

Career Highlights

Hiroyasu Tabuchi is currently employed at Kirin Beer Kabushiki Kaisha, where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology used in packaging and other applications requiring high-performance materials.

Collaborations

He collaborates with talented coworkers, including Masaki Nakaya and Mari Shimizu, who contribute to his research and development efforts.

Conclusion

Hiroyasu Tabuchi's contributions to thin film technology and gas barrier materials have positioned him as a key figure in his field. His innovative patents reflect his commitment to advancing technology for practical applications.

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