This inventor holds 1 USPTO granted patent. Top assignee: Honshu Chemical Industry Co., Ltd.. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Hiroyasu Oono: Innovator in Liquid Crystal Materials
Introduction
Hiroyasu Oono is a notable inventor based in Wakayama, Japan. He has made significant contributions to the field of materials science, particularly in the development of compounds useful for synthetic resins and photoresists.
Latest Patents
Hiroyasu Oono holds a patent for 4,4'-dihydroxyphenyl bicyclohexenes. This invention focuses on producing new 4,4'-dihydroxyphenyl bicyclohexenes that are beneficial as materials for liquid crystal polyester, polycarbonate, polyurethane, or other synthetic resins. Additionally, these compounds are useful for photoresist applications in display elements and semiconductors. The process involves thermally decomposing 4,4,4′4′-tetrahydroxyphenyl bicyclohexanes, preferably in the presence of an alkali catalyst.
Career Highlights
Hiroyasu Oono is associated with Honshu Chemical Industry Co., Ltd., where he has been instrumental in advancing research and development in chemical materials. His innovative work has led to practical applications in various industries.
Collaborations
Hiroyasu has collaborated with notable colleagues, including Kouji Satomi and Kenji Ekawa, to further enhance the impact of his research and inventions.
Conclusion
Hiroyasu Oono's contributions to the field of materials science, particularly through his patent on 4,4'-dihydroxyphenyl bicyclohexenes, highlight his role as an innovator in developing advanced materials for modern technology. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile