Hiroyasu Kikuchi

Title: Hiroyasu Kikuchi: Innovator in Silicon Wafer Technology

Introduction

Hiroyasu Kikuchi is a notable inventor based in Nishigo-mura, Japan. He has made significant contributions to the field of silicon wafer technology, holding 2 patents that enhance the manufacturing and quality assessment processes of silicon wafers.

Latest Patents

Kikuchi's latest patents include a "Method for determining defect region" and a "Method for manufacturing silicon single crystal wafer." The first patent outlines a process for identifying defect regions in silicon wafers sliced from silicon single crystals produced by the Czochralski method. This method involves mirror-surface processing to achieve a low haze level, measuring defects using advanced particle counters, and determining defect regions based on the collected data. The second patent describes a method for producing silicon single crystal wafers, which includes rapid thermal annealing in various atmospheres to enhance the quality of the wafers.

Career Highlights

Kikuchi is currently employed at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work focuses on improving the quality and efficiency of silicon wafer production, which is crucial for various electronic applications.

Collaborations

Throughout his career, Kikuchi has collaborated with esteemed colleagues such as Yoshinori Hayamizu and Kazuya Tomii. These collaborations have contributed to the advancement of technologies in the semiconductor field.

Conclusion

Hiroyasu Kikuchi's innovative work in silicon wafer technology has made a significant impact on the industry. His patents reflect a commitment to enhancing manufacturing processes and ensuring high-quality semiconductor materials.