Hiroyasu Iimori

Title: Hiroyasu Iimori: Innovator in Semiconductor Processing

Introduction

Hiroyasu Iimori is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods and apparatuses that enhance substrate processing.

Latest Patents

Iimori's latest patents include a substrate processing method and a substrate processing apparatus. The substrate processing method involves treating a substrate with a first liquid, which has a structural body formed on its major surface. This method includes forming a support member by bringing a second liquid into contact with the substrate and changing part of the second liquid into a solid. Additionally, the method allows for the removal of the support member by transitioning it from a solid phase to a gaseous phase without passing through a liquid phase.

The semiconductor manufacturing apparatus he developed features a stage with multiple pins to hold a semiconductor substrate. This apparatus includes a nozzle that ejects a liquid chemical toward the substrate's surface and an optical measurer that radiates light to measure the displacement of the substrate during the chemical ejection process.

Career Highlights

Hiroyasu Iimori is currently employed at Kioxia Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Iimori collaborates with talented coworkers, including Yoshihiro Uozumi and Shinsuke Kimura. Their combined expertise contributes to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Hiroyasu Iimori's contributions to semiconductor processing through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence advancements in technology and manufacturing processes.