Osaka, Japan

Hirotsugu Nishikawa


Average Co-Inventor Count = 4.5

ph-index = 3

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1989-1992

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3 patents (USPTO):Explore Patents

Title: Hirotsugu Nishikawa: A Pioneer in Electrophotosensitive Materials

Introduction

Hirotsugu Nishikawa is a notable inventor based in Osaka, Japan, recognized for his contribution to the field of electrophotosensitive materials. With a total of three patents to his name, Nishikawa's innovative work has significantly impacted the industry, particularly in the development of advanced materials used in various applications.

Latest Patents

Nishikawa's latest patents reflect his expertise and focus on improving electrophotosensitive materials. His first notable invention is an electrophotosensitive material that incorporates an x-type metal-free phthalocyanine. This technology combines a conductive substrate with a photosensitive layer that includes a perylene compound and a diamine derivative as critical components. The result is a material that exhibits exceptional sensitivity and reproducibility.

Another significant patent is for an organic laminated photosensitive material of the positive charging type. This innovation features a unique structure comprising an electroconductive substrate, a charge-transporting layer, and a charge-generating and transporting layer. The carefully selected components allow for efficient hole injection between the layers, ultimately leading to a marked improvement in sensitivity and overall performance.

Career Highlights

Nishikawa is currently associated with Mita Industrial Co., Ltd., where he continues to explore and develop new technologies in the realm of electrophotosensitive materials. His contributions to the field are recognized by peers and clients alike, establishing him as a leader in the creation of forward-thinking materials.

Collaborations

Hirotsugu Nishikawa has collaborated with several talented individuals, including Masashi Tanaka and Keizo Kimoto. These partnerships have not only enhanced his research but also fostered innovation within Mita Industrial Co., Ltd., enabling the development of cutting-edge materials that meet the evolving needs of the industry.

Conclusion

Hirotsugu Nishikawa’s innovative approach and dedication to advancing electrophotosensitive materials underscore his importance in the field. With a solid portfolio of patents and fruitful collaborations, he continues to shape the future of material science, ensuring that his work remains influential in both academic and industrial settings.

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