Tokyo, Japan

Hirotake Sato

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nec Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirotake Sato. Retrieved from https://idiyas.com/inventor/hirotake-sato-onvhz2j2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hirotake Sato: Inventor of a Flexible Authentication System.

Introduction

Hirotake Sato is an inventor based in Tokyo, Japan, associated with NEC Corporation. His patent work addresses authentication using biometric, knowledge, and possession information.

Latest Patents

Sato is credited with 1 patent: “Authentication Apparatus, Authentication Method, and Non-Transitory Recording Medium Using Biometric Information and Knowledge Information.” The invention describes a system that performs biometric authentication alongside checks based on information a person knows or possesses. It can determine authentication is successful when biometric and first knowledge- or possession-based checks succeed. It also allows successful authentication when two distinct knowledge- or possession-based checks succeed, even if biometric authentication fails.

Career Highlights

Sato’s listed patent highlights an approach that combines multiple authentication factors and provides an alternative path when biometric verification is unsuccessful. The available information identifies him as an inventor associated with NEC Corporation.

Collaborations

Yuki Shimizu is identified as Sato’s coworker. The provided information does not specify whether Shimizu collaborated on this patent.

Conclusion

Hirotake Sato’s patent presents a flexible authentication method that combines biometric verification with distinct knowledge- or possession-based checks.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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