Hamamatsu, Japan

Hirotaka Nonaka

This inventor holds 1 USPTO granted patent. Top assignee: Hamamatsu-Photonics K.k.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirotaka Nonaka. Retrieved from https://idiyas.com/inventor/hirotaka-nonaka-2d16ypes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Hirotaka Nonaka: Semiconductor Inspection and Cooling Innovation.

Introduction

Hirotaka Nonaka is an inventor associated with Hamamatsu Photonics K.K. in Hamamatsu, Japan. His patent work includes a cooling technology designed for semiconductor-device inspection. The available information lists 1 patent for him.

Latest Patents

Nonaka is named on the patent “Cooling Unit, Objective Lens Module, Semiconductor Inspection Device, and Semiconductor Inspection Method.” The invention describes a cooling unit that dissipates heat from a semiconductor device while allowing light from the device to pass through an opening in the unit’s jacket. The jacket’s surface defines a space facing the semiconductor device, and a supply flow path carries fluid into that space. This design supports cooling during optical inspection.

Career Highlights

The patent reflects work at the intersection of thermal management and semiconductor inspection. By combining a light-passing portion with fluid-based cooling, the disclosed system addresses the need to manage heat without obstructing optical access to the device.

Collaborations

The listed coworkers associated with Nonaka are Tomonori Nakamura and Hiroyuki Matsuura. The provided information does not specify their roles in the patent or their particular contributions.

Conclusion

Hirotaka Nonaka’s listed patent presents a cooling approach intended to support semiconductor inspection while preserving a path for light to reach the device.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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