This inventor holds 5 USPTO granted patents. Top assignees: Fuji Photo Film Company, Limited, Fujifilm Olin Co., Ltd.. Active years: 1994-2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 1994-2001
Title: Hiroshi Yoshimoto: Innovator in Anti-Reflective Coating Materials
Introduction
Hiroshi Yoshimoto is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of materials science, particularly in the development of anti-reflective coating materials. With a total of 5 patents to his name, Yoshimoto's work has had a considerable impact on various industries.
Latest Patents
Yoshimoto's latest patents focus on a composition for anti-reflective coating material. This composition includes a polymer compound with specific repeating units and may also contain melamine, guanamine, urea, phenol, naphthol, or hydroxyanthracene compounds. These compounds are substituted by at least one group selected from methylol and alkoxymethyl groups at two or more positions. The innovative composition is designed to reduce the adverse effects of reflection by the substrate during lithographic processes that utilize various radiations. Additionally, a resist pattern formation process that incorporates this composition is also disclosed in his patents.
Career Highlights
Throughout his career, Yoshimoto has worked with prominent companies such as Fuji Photo Film Company, Limited and Fujifilm Olin Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and innovation.
Collaborations
Yoshimoto has collaborated with notable coworkers, including Kazuyoshi Mizutani and Kazuya Uenishi. These partnerships have contributed to the advancement of his research and development efforts.
Conclusion
Hiroshi Yoshimoto's contributions to the field of anti-reflective coating materials demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to improving processes in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile