Amagasaki, Japan

Hiroshi Takahashi

This inventor holds 1 USPTO granted patent. Top assignee: Daicel Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Takahashi. Retrieved from https://idiyas.com/inventor/hiroshi-takahashi-xpqglon8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations of Hiroshi Takahashi

Hiroshi Takahashi is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of materials science, particularly in the development of anti-glare films. His work has implications for various industries, including electronics and automotive.

Latest Patents

Hiroshi Takahashi holds a patent for an innovative anti-glare film and the process for producing the same. This anti-glare film features an anti-glare layer with a ridge on its surface. The ridge is formed through the phase separation of multiple resin components, resulting in a branched structure. The total length of the ridge is not less than 100 μm, and there are one or more ridges per square millimeter on the surface of the anti-glare layer. This invention enhances visibility and reduces glare, making it valuable for various applications.

Career Highlights

Hiroshi Takahashi is associated with Daicel Corporation, where he has been instrumental in advancing the company's research and development efforts. His expertise in materials science has led to innovative solutions that address industry challenges.

Collaborations

Some of his coworkers include Masaki Hayashi and Masashi Yokoyama. Their collaborative efforts contribute to the success of projects at Daicel Corporation.

Conclusion

Hiroshi Takahashi's contributions to the field of anti-glare films demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in materials science, showcasing the potential for improved visibility in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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