Kanagawa, Japan

Hiroshi Sohda

This inventor holds 1 USPTO granted patent. Top assignee: Fujifilm Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Sohda. Retrieved from https://idiyas.com/inventor/hiroshi-sohda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hiroshi Sohda: Innovator in Vacuum Film Deposition Technology

Introduction

Hiroshi Sohda is a prominent inventor based in Kanagawa, Japan. He is known for his contributions to the field of vacuum film deposition technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of film deposition processes.

Latest Patents

Hiroshi Sohda holds a patent for a vacuum film deposition apparatus. This apparatus is designed to form a film on a substrate using a vacuum film deposition technique. It includes substrate holding means for securely holding the substrate, a deposition preventing member to avoid film deposition at undesired positions within the apparatus, and contacting means that facilitate contact between the substrate or the substrate holding means and the deposition preventing member.

Career Highlights

Hiroshi Sohda is currently employed at Fujifilm Corporation, a leading company in imaging and information technology. His work at Fujifilm has allowed him to focus on advancing film deposition technologies, contributing to the company's reputation for innovation and quality.

Collaborations

Hiroshi has collaborated with notable colleagues such as Yukinori Nakamura and Makoto Kashiwaya. Their combined expertise has fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Hiroshi Sohda's contributions to vacuum film deposition technology exemplify his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…