Izumiotsu, Japan

Hiroshi Ozawa

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Ink and Chemicals, Incorporated. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Ozawa. Retrieved from https://idiyas.com/inventor/hiroshi-ozawa-sjrj0209

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1989

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hiroshi Ozawa: Innovator in Resin Technology

Introduction

Hiroshi Ozawa is a notable inventor based in Izumiohtsu, Japan. He has made significant contributions to the field of resin technology, particularly with his innovative patent that addresses the need for effective room-temperature-curable materials.

Latest Patents

Ozawa holds a patent for a room-temperature-curable resin composition. This composition consists essentially of (A) a vinyl polymer containing a basic nitrogen atom and (B) a compound that includes both an epoxy group and a hydrolyzable silyl group in each molecule. The resin composition is particularly useful as a paint, adhesive, or sealing agent, showcasing its versatility in various applications.

Career Highlights

Hiroshi Ozawa is associated with Dainippon Ink and Chemicals, Incorporated, where he has been able to apply his expertise in resin technology. His work has contributed to advancements in materials that are essential for various industrial applications.

Collaborations

Ozawa has collaborated with notable colleagues such as Masataka Ooka and Shinichi Kuwamura. These partnerships have likely enhanced the development and application of innovative materials in their respective fields.

Conclusion

Hiroshi Ozawa's contributions to resin technology through his patent demonstrate his commitment to innovation. His work continues to impact the industry positively, providing solutions that meet modern needs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…