This inventor holds 1 USPTO granted patent. Top assignee: Denso Corporation. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Hiroshi Otsuki: Innovator in Semiconductor Technology
Introduction
Hiroshi Otsuki is a notable inventor based in Okazaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the measurement of oxide film thickness.
Latest Patents
Otsuki holds a patent for a method for measuring the thickness of an oxide film. This innovative technique is crucial in the manufacturing process of semiconductor devices. After the formation of a gate oxide film, the thickness is measured by determining an exposure period, which is defined from the time the oxide film is formed to the time the thickness is measured. If necessary, the measurement can be corrected to ascertain the real thickness based on the exposure period. This method ensures accurate measurement of the gate oxide film thickness.
Career Highlights
Hiroshi Otsuki is associated with Denso Corporation, a leading company in the automotive technology sector. His work has been instrumental in enhancing the precision of semiconductor manufacturing processes.
Collaborations
Otsuki has collaborated with notable colleagues, including Atsushi Komura and Hisato Kato, contributing to advancements in their field.
Conclusion
Hiroshi Otsuki's innovative approach to measuring oxide film thickness has made a significant impact on semiconductor manufacturing. His contributions continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile