Chiba, Japan

Hiroshi Otake

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Otake. Retrieved from https://idiyas.com/inventor/hiroshi-otake-qeddxmai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: **Innovator Spotlight: Hiroshi Otake**

Introduction

Hiroshi Otake, an accomplished inventor based in Chiba, Japan, has made significant contributions to the field of semiconductor technology. With a strong focus on enhancing efficiency in semiconductor processing, his innovative approach has led to the development of a unique process kit that improves substrate support in semiconductor process chambers.

Latest Patents

Hiroshi Otake holds one patent, titled "Low Profile Process Kit." This invention is integral to the design of process kits for substrate supports utilized in semiconductor substrate process chambers. The patent outlines several embodiments of a process kit that features an annular body with an inner and outer edge, horizontal alignment, and distinct upper and lower surfaces. Notably, the design includes an inner lip extending vertically from the upper surface and an outer lip on the lower surface, shaped to conform with the substrate support pedestal. Additionally, some embodiments describe a process kit with an upper surface sloped at an angle ranging from 5 to 65 degrees, facilitating better performance and efficiency in semiconductor processing.

Career Highlights

Hiroshi is currently employed at Applied Materials, Inc., a leader in materials engineering solutions. Here, he leverages his expertise in semiconductor technology, working tirelessly to drive innovation and improvements within the industry. His tenure at the company marks a significant chapter in his professional journey, where he continues to contribute to cutting-edge developments in semiconductor fabrication.

Collaborations

During his career, Hiroshi has had the opportunity to collaborate with talented individuals such as Muhammad M. Rasheed and Teruki Iwashita. These collaborations have allowed for the blending of diverse ideas and expertise, further enriching the innovative spirit within Applied Materials, Inc.

Conclusion

Hiroshi Otake's work exemplifies the drive for innovation in the semiconductor industry. With his patent for the low profile process kit, he has made strides in enhancing the operational capabilities of semiconductor process chambers. His collaborations and ongoing contributions to Applied Materials, Inc. underscore the importance of teamwork in fostering advancements in technology. As the industry continues to evolve, inventors like Hiroshi play an essential role in shaping its future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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