Ibaraki, Japan

Hiroshi Oshima

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Maxell, Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Oshima. Retrieved from https://idiyas.com/inventor/hiroshi-oshima-1naha9r2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Hiroshi Oshima: Innovator in Projector Technology

Introduction

Hiroshi Oshima is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of projector technology, particularly with his innovative designs and patents. His work has been instrumental in enhancing the functionality and efficiency of projectors used in various applications.

Latest Patents

Hiroshi Oshima holds a patent for a "Lamp for Projector." This invention showcases his ability to improve existing technologies and provide solutions that meet the evolving needs of users. With 1 patent to his name, Oshima continues to demonstrate his commitment to innovation in the industry.

Career Highlights

Oshima is currently employed at Hitachi Maxell, Limited, a company known for its advancements in electronic products and technologies. His role at Hitachi Maxell allows him to collaborate with other talented professionals and contribute to groundbreaking projects.

Collaborations

Throughout his career, Hiroshi Oshima has worked alongside esteemed colleagues such as Eiki Ishijima and Shinro Inui. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

Hiroshi Oshima is a dedicated inventor whose work in projector technology has made a lasting impact. His patent for a lamp for projectors exemplifies his innovative spirit and commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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