Kurashiki, Japan

Hiroshi Ono

This inventor holds 1 USPTO granted patent. Top assignee: Kuraray Co., Ltd.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Ono. Retrieved from https://idiyas.com/inventor/hiroshi-ono-p2l89xwn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Hiroshi Ono - Innovator in Optical Recording Technology

Introduction

Hiroshi Ono is a notable inventor based in Kurashiki, Japan. He has made significant contributions to the field of optical recording technology. His innovative work has led to the development of a unique optical recording medium.

Latest Patents

Hiroshi Ono holds a patent for an optical recording medium. This medium consists of a substrate and a thin metal film laminated thereon, formed of a noble metal, a chalcogen, and bismuth as essential components. The specific composition is defined within a phase diagram, allowing the medium to absorb a laser beam of a specific wavelength region. This capability enables the recording of information through pits and cavities formed in the film by the laser beam. He has 1 patent to his name.

Career Highlights

Ono is associated with Kuraray Co., Ltd., where he has been able to apply his expertise in optical technologies. His work has been instrumental in advancing the capabilities of optical recording media.

Collaborations

Throughout his career, Hiroshi Ono has collaborated with notable colleagues, including Minoru Ikeda and Masaki Ishii. These collaborations have contributed to the development of innovative technologies in their field.

Conclusion

Hiroshi Ono's contributions to optical recording technology highlight his role as a significant inventor. His patented work continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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